石英光纤表面化学镀Ni-P的工艺研究及其表征  

Technique and Characterization of Ni-P Film on Quartz Optical Fiber Surface by Electroless Plating

作　　者：蒋柏泉[1] 李春[1] 白立晓[1] 张华[2] 刘贤相[1] 曾庆芳[3] 

机构地区：[1]南昌大学环境与化学工程学院,江西南昌330031 [2]南昌大学机电学院,江西南昌330031 [3]南昌大学外国语学院,江西南昌330031

出　　处：《南昌大学学报（工科版）》2008年第3期205-208,共4页Journal of Nanchang University(Engineering & Technology)

基　　金：国家"973"资助项目(2005cca04300)

摘　　要：以Ni-P镀层与裸光纤表面的结合力和Ni-P沉积速度为双目的指标,采用正交实验法分别考察了NiSO4.6H2O、NaH2PO2.H2O、C3H6O2、H3BO3浓度、pH值和温度对石英光纤表面化学镀Ni-P的影响,并确定了它们的优化条件分别为:35 g.L-1,32 g.L-1,20 mL.L-1,28g.L-1,pH5和84℃。考察了粗化时间对镀层质量的影响。用扫描电镜(SEM)、体视显微镜(SM)、等离子发射光谱仪(ICP)和X-Ray衍射仪(XRD)对镀层的形貌、组成和结构进行了表征和分析。结果表明,在选定的光纤表面预处理条件和最优的化学镀条件下,Ni-P镀层表面平整光亮,结合力好,热震后无起泡和脱落现象发生。Orthogonal experiment method was used to investigate the effects of NiSO4 · 6H2O ,NaH2PO2·H2O ,C3H6O2 ,H3BO3 ,pH and temperature on electroless Ni-P plating on quartz optical fiber surface when the combination extent between Ni-P thin film and fiber surface and Ni-P deposition rate were taken as the two objuctive functions. The optimal values of the six factors above were determined as： 35 g ·L^-1 , 32 g ·L^-1 , 20 mL ·L^-1 , 28 g ·L^-1, pH 5 and 84 ℃, respectively. The effect of coarsening time on film quarlity was also studied. SEM, SM, ICP and XRD were used to characterize and analyze the morphology, composition and structure of Ni-P film, respectively. The results showed that the Ni-P film deposited under the selected pretreatment conditions and the optimal electroless plating conditions has qualified properties with smoother and lucent surface, good combining force and without falling off after thermal shock test.

关 键 词：化学镀 石英光纤 NI-P NI 

分 类 号：O643.3[理学—物理化学] TQ153.3[理学—化学]