化学镀Ni-P薄膜生长过程的Monte Carlo模拟  

Monte Carlo simulation of the growth of electroless Ni-P film

作　　者：李庆成[1] 胡献国[1] 孙晓军[2] 

机构地区：[1]合肥工业大学机械与汽车工程学院,安徽合肥230009 [2]中国科学院兰州化学物理研究所,甘肃兰州730000

出　　处：《合肥工业大学学报（自然科学版）》2008年第10期1606-1609,共4页Journal of Hefei University of Technology：Natural Science

基　　金：固体润滑国家重点实验室开放课题资助项目(0401)

摘　　要：运用Monte Carlo方法和Srolovitz等人提出的Q-state Potts模型对化学镀Ni-P薄膜生长过程进行了计算机二维形貌模拟,考察了薄膜生长时间对晶粒大小的影响。结果表明,晶粒的长大是一个相互吞噬的动态过程,随着薄膜生长,晶粒逐渐变大,单位表面内晶粒数目减少。但是当薄膜生长约500 MCS后,晶粒的平均粒径基本不变,约为9.1个基本单位,相同表面内晶粒数目达到动态平衡,这与实验结果相符。The Monte Carlo method and the Q-state Potts model are applied to the simulation of the grains growfh of electroless Ni-P film with a two-dimensional image. The relation between the time of the growth and the size of the Ni-P grains is studied during the simulation. The electroless technique is used to prepare the coating of the Ni-P alloy, and the simulation and experimental results are com- pared. The results indicate that the growth of the grains is a dynamic process, and the number of the grains in unit area becomes less with the growing of the average size. However, thenumber of the grains becomes dynamic balance after 500 MCS,and the average size is found to be approximately 9.1 units, which is consistent with the experimental result.

关 键 词：蒙特卡罗 薄膜 模拟 化学镀层 

分 类 号：O411.3[理学—理论物理]