非球面拼接测量中偏置误差修正模型  

Revising model for the bias errors correcting during stitching measure aspheric surface

作　　者：乔玉晶[1] 谭久彬[1] 王伟波[1] 

机构地区：[1]哈尔滨工业大学超精密光电工程研究所,黑龙江哈尔滨150080

出　　处：《光电子．激光》2008年第11期1497-1501,共5页Journal of Optoelectronics·Laser

基　　金：国家自然科学基金资助项目(50675052)

摘　　要：为解决非球面拼接测量时两子孔径重叠区精确拟合问题,根据波像差理论推导了子孔径干涉测量二次曲面偏置误差与运动自由度之间的函数关系,通过分析得出了偏置误差的作用表现形式与Seidle像差相一致的结论,据此建立了定位机构偏置误差修正模型,提出了一种精确拼接测量二次曲面的像差修正方法,该方法利用最小二乘拟合获得拼接系数,可得到孔径间偏置误差估计值,并可在模型中修正高阶系统像差,提高孔径间重叠区拟合精确度。实验表明,该方法拼接精度高于传统校准三方向调整误差拼接法。In order to find a solution to fitting the overlap of two sub-apertures precisely. Derive the function relation between the bias errors and movement freedom for sub-aperture intefferometry conicoid. The result of analysis shows,the action appearance of bias errors act in accord with Seidle aberration. And present correcting aberrations method for precise stitching interferometry conicoid. By means of founding a revising bias errors model of stitching measure,obtain the stitching coeffidents with least square fitting method,and acquire the estimate values of bias errors. This method improve the sub-apertures overlap＇s fitting precision, because revise the high order aberration of system. The experiment result shows, the stitching precision of this stitching method is higher than traditional stitching method of correcting three adjust errors.

关 键 词：拼接测量 非球面 偏置误差 修正模型 

分 类 号：TG83[金属学及工艺—公差测量技术]