热处理工艺对磁控共溅射制备Fe-Mn-Si薄膜组织形貌的影响  

Effect of Heat Treatment on Microstructure of Fe-Mn-Si Alloy Films Prepared by Magnetron Multi-sputtering

作　　者：何亮[1] 钱士强[1] 李伟[1] 

机构地区：[1]上海工程技术大学材料工程学院,上海201620

出　　处：《热加工工艺》2008年第20期66-68,共3页Hot Working Technology

基　　金：上海市教委培养选拔优秀青年教师科研专项基金资助项目(06XPYQ18)

摘　　要：采用磁控共溅法制备Fe-Mn-Si磁性形状记忆合金薄膜,并将制备薄膜在不同的温度下进行真空热处理,比较了不同热处理温度下薄膜的组织形貌。结果表明,制备薄膜组织成分均匀,热处理前主要为γ(fcc)相,经400℃真空热处理2h后,薄膜含有γ(fcc)和ε(hcp)相。随着热处理温度升高,溅射薄膜颗粒增大,表面粗糙度增加。The Fe-Mn-Si ferromagnetic shape memory alloy films were prepared using magnetron multi-sputtering technique. Then the prepared films were vacuum-annealed at different temperature. The phase and microstructure of the films at different preparation parameters were discussed. The results show that the composition of the films is well-proportioned. The XRD shows that the main phase of the as-deposited films is γ（fcc）, after annealed at 400℃ for2 h,γ（fcc）and a few ε（hcp） phase can be found in the films. It shows that, with the increase of heat treatment temperature, the dimension of the grain increases and the surface coarseness improves obviously too.

关 键 词：Fe-Mn-Si合金薄膜 薄膜磁控共溅 真空热处理 

分 类 号：TG139.6[一般工业技术—材料科学与工程]