超精抛光中边缘效应对材料去除量的影响  

Edge effects on material removal amount in ultra precise polishing process

作　　者：杨炜[1] 郭隐彪[1] 许乔[2] 李亚国[2] 

机构地区：[1]厦门大学机电工程系,福建厦门361005 [2]成都精密光学工程研究中心,成都610041

出　　处：《强激光与粒子束》2008年第10期1653-1657,共5页High Power Laser and Particle Beams

基　　金：国家高技术发展计划项目;福建省重大科技专项基金资助课题

摘　　要：传统环抛加工一般将工件整个包围在抛光盘内,加工之后虽然可以获得较好的工件表面,但是需耗费较多的时间,生产效率较低。针对这种情况,借助PPS快速抛光机床,依据Preston公式,对露出抛光盘的工件部分,即对所谓的边缘效应进行研究,用新的表面模型表示非线性压强分布,合理地避开了线性模型造成的压强负值问题。并且对工件材料去除量进行仿真计算,建立了新的去除模型,得出了偏心距、工件半径和抛光盘转速比值对材料去除量的影响。根据此模型,选择适当的偏心距和转速比对工件进行加工,可获得较好面型。The edge effects would happen when a workpiece extends beyond a polishing tool, which could lead to low polishing efficiency. So a new skin model, representing the nonlinear pressure distribution, was proposed to avoid the negative pressure and to calculate the amount of removed materials for the case of a circular tool that polishes a circular workpiece. A material removal amount model was established considering workpiece radius, workpiece-tool center distance and speed ratio. Its simulations show that good surface figures could be achieved by choosing proper values for the latter two parameters based on that model.

关 键 词：超精抛光 边缘效应 表面模型 压强分布 去除量 

分 类 号：TG701[金属学及工艺—刀具与模具]