渗硅制备Mo-MoSi2梯度材料层的特性  

The Character of Mo-MoSi_2 Gradient Material Layer Made by Ihrigizing

作　　者：李运刚[1] 李智慧[1] 马瑞新[2] 张士宪[1] 唐国章[1] 梁精龙[1] 

机构地区：[1]河北理工大学,河北唐山063009 [2]北京科技大学,北京100083

出　　处：《稀有金属材料与工程》2008年第11期1992-1995,共4页Rare Metal Materials and Engineering

基　　金：国家自然科学基金项目(50474079)资助

摘　　要：以Mo为基体,利用KCl-NaCl-NaF-(SiO2)熔盐体系电沉积出的硅作为渗硅硅源,电沉积硅和在Mo基体上渗硅同时进行,制备Mo-MoSi2梯度材料。以实验结果和理论计算为依据,对梯度层的特性进行了分析。结果表明:梯度层硅含量呈3种不同的变化规律,在靠近试样表面部分,硅含量沿深度下降率较大,在梯度层中间部分,硅含量基本保持不变,在梯度层靠近Mo一侧,硅含量的下降率介于前两者之间;梯度层中,以Mo、Mo3Si、Mo5Si33种物质构成的厚度占整个梯度层的比重最大;梯度层沿Mo基体一侧向表面的物质组成变化规律为:Mo→Mo5Si3+Mo3Si+Mo→Mo5Si3+MoSi2→MoSi2,并且各物质所占的比重随硅含量的变化而变化。Mo-MoSi2 gragient material is made by ihrigizing, on Mo basal body, using the silicon electrodeposited in KC1-NaC1-NaF-（SiO2） system as silicon source. The character of gradient layer is analyzed by experimental result and theoretical calculation. The results are as following. The silicon content in gradient layer appears three changing regularity. The silicon content declines rapidly along depth in approaching gradient layer surface. The silicon content is almost invariable in middle section of gradient layer. The declining rate of silicon content is slow comparatively in the section near Mo basal body. The gradient layer made up of Mo＋Mo3Si＋Mo5Si3 is more thick than that of else. The changing regular pattern of gradient layer substance composition along Mo basal body to gradient layer surface is Mo→ Mo5Si3 ＋ Mo3Si ＋ Mo→Mo5Si3 ＋ MoSi2→MoSi2 and the rate of each substance content changes with silicon content.

关 键 词：Mo-MoSi2梯度材料 特性 物质组成 

分 类 号：TB34[一般工业技术—材料科学与工程]