射频源原子氧暴露对PET薄膜表面性能的影响  

Effect of RF-induced atomic oxygen exposure on surface properties of PET films

作　　者：李胜刚[1] 张丹[2] 田修波[1] 黄永宪[1] 杨士勤[1] 

机构地区：[1]哈尔滨工业大学材料科学与工程学院现代焊接生产技术国家重点实验室,黑龙江哈尔滨150001 [2]上海思博职业技术学院卫生技术与护理学院卫生信息管理系,上海201300

出　　处：《真空》2008年第6期8-11,共4页Vacuum

基　　金：国家自然科学基金(10775036);新世纪优秀人才计划资助项目

摘　　要：采用射频源原子氧装置对PET薄膜材料进行不同时间的暴露试验。研究了氧等离子体暴露对PET薄膜的质量损失、表面形貌、接触角的影响,并对暴露前后PET薄膜进行了红外光谱(FTIR)分析。结果表明,温度随暴露时间延长而升高,达到一定值后趋于平缓;随暴露时间延长PET薄膜的质量损失越来越大,表面形貌变得越来越粗糙,接触角先减小后增大。红外光谱分析表明,氧等离子体暴露后PET薄膜表面O-C=O、C-O等含氧基团的数量有所降低。这是由于原子氧暴露诱导的氧化和表面刻蚀。PET thin film samples were exposed to atomic oxygen （AO） whicn came from radio-frequency discharge for different times. Effects of the AO exposure on the mass loss, surface morphology and contact angle of the samples were investigated with their surface structure analyzed using FTIR before and after the exposure. The results indicated that the sample temperature increases with exposure time and stabilizes after a certain time, and its mass loss and surface roughness also increase with exposure time. Meanwhile, the contact angle decreases first then increases. The FTIR results demonstrated that the amount of such functional groups in film surface as O-C=0 and C-O oxygen-radicals decrease after the exposure, and this may be attributed to the oxidation and etching effect induced by AO exposure.

关 键 词：氧等离子体 PET薄膜 质量损失 表面形貌 接触角 

分 类 号：V255.2[一般工业技术—材料科学与工程]