原子氧对紫外光固化有机硅环氧树脂的作用  

Atomic Oxygen Effects on UV-cured Silicon-containing Epoxy Resins

作　　者：杨光[1] 黄鹏程[1] 

机构地区：[1]北京航空航天大学材料科学与工程学院,北京100083

出　　处：《宇航学报》2008年第6期2036-2040,共5页Journal of Astronautics

基　　金：航天科技创新基金

摘　　要：通过对光固化有机硅环氧树脂进行地面模拟原子氧效应试验,利用扫描电镜(SEM)和X射线光电子能谱(XPS)等分析了试验前后试样的质量损失、表面形貌和表面成分等的变化。研究结果表明,有机硅环氧树脂经紫外光固化后,试样表面被部分氧化,硅氧主链结构中的-R(甲基或苯基)侧基被不完全氧化成含O的基团结构。在7.43×1015atoms/cm2.s通量的原子氧暴露8h试验后,试样表面形成一层氧化硅(SiOx)膜,膜中含65%的SiO2,有助于防止原子氧对材料的进一步侵蚀。The silicon-containing epoxy resins were cured by ultraviolet irradiation, and then atomic oxygen （AO） exposure experiments were carried out in the ground AO effects simulation facility, The changes in mass loss, surface morphology and composition of the sample were investigated. The results show that the UV-curing treatment partially oxidizes the R（ methyl or phenyl） side groups in the main chain of the silicon-containing epoxy resin to bridging oxygen species. Based on scanning electron microscopy （SEM） and X-ray photoelectron spectroscopy（XPS）data, it was proposed that the 8h AO exposure of the materials at a flux of 7.43×10^15 atoms/cm^2·s produces a SiOx film containing 65 % SiO2 at the surface of the sample,which acts as a protective layer preventing further degradation of the underlying resin.

关 键 词：环氧树脂 有机硅 紫外光固化 地面模拟 耐原子氧 

分 类 号：TQ323.5[化学工程—合成树脂塑料工业] V258[一般工业技术—材料科学与工程]