有机分子修饰硅表面  

Organic Molecule Modified Silicon Surface

作　　者：李珩[1,2] 温永强[2] 杨青林[1] 宋延林[2] 

机构地区：[1]北京航空航天大学材料科学与工程学院,北京100080 [2]中国科学院化学研究所有机固体重点实验室,北京100190

出　　处：《化学进展》2008年第12期1964-1971,共8页Progress in Chemistry

基　　金：国家自然科学基金项目(No.50625312,60601027,U0634004,20721061);国家重点基础研究发展计划(973)项目(No.2006CB806200,2006CB932100)资助

摘　　要：硅作为一种重要的半导体材料,在微电子领域发挥着极其重要的作用。有机单分子层修饰硅表面是近年来硅表面化学领域的一个研究热点,引起了研究者的广泛重视。以共价键嫁接在硅表面的有机单分子层能形成稳定、高质量的杂化连接,将赋予传统硅材料更多新功能,具有许多其他表面难以比拟的优点。本文针对有机分子修饰硅表面的方法、单层膜的表征和应用,对近年来的最新研究进展进行了综述,并对该方向今后的发展进行了展望。Although a number of alternatives to silicon-based materials have been proposed, silicon remains the basic material of electronic industry. Recently the research of silicon surface modified by organic molecules has become the highlight in surface chemistry. Organic monolayers covalently attached on silicon surface present stable, reproducible and well-controlled solid surfaces and possess many advantages compared with other surfaces, which will contribute more functions to Si-based materials and microelectronics. In this paper, the recent progress is presented on the methods, characterizations and applications of silicon surface modified by monolayers of organic molecules. Furthermore, the paper brings forward perspectives toward in-depth investigation of organic molecules grafted silicon surface.

关 键 词：晶体硅 单层膜 有机分子 表面改性 

分 类 号：O649.9[理学—物理化学]