纳米二氧化硅辐射接枝制备离子交换吸附材料及其吸附性能  

Synthesis of Ion Exchange Absorption Materials by Nano Silicon Dioxide Radiation Grafting and Their Adsorption Properties

作　　者：孙贵生[1] 俎建华[1] 刘新文[1] 童龙[1] 

机构地区：[1]上海大学射线应用研究所,上海201800

出　　处：《高分子材料科学与工程》2008年第12期164-167,共4页Polymer Materials Science & Engineering

基　　金：国家自然科学基金资助项目(50303009)

摘　　要：利用偶联剂对纳米二氧化硅进行表面化学改性,制备了乙烯基活化的纳米二氧化硅。运用γ射线引发共辐射接枝的方法在改性纳米二氧化硅上接枝甲基丙烯酸缩水甘油酯(GMA)单体,得到SiO2-g-GMA接枝共聚物,然后在共聚物表面进行氨化反应得到吸附材料。研究了单体浓度、吸收剂量等因素对GMA接枝率的影响规律,明确了反应条件与接枝率的对应关系。采用傅立叶变换红外光谱(FT-IR)表征接枝物的结构,研究了pH值、GMA接枝率、最大试样体积等影响因子对吸附的影响。The surface of nano silicon dioxide was modified by silane coupling agent, producing vinyl nano silicon dioxide. Then glycidyl methacrylate （GMA） monomer was grafted to Modified nano silicon dioxide by 7 irradiation induced simultaneous irradiation grafting method, SiO2-g-GMA Grafting Copolymer was gained. Then the surface of SiO2-g-GMA Grafting Copolyrner was treated with NH（CH3）2. Effects of monomer concentration, absorbed dose on the GMA grafting yield were studied. It is found that for simultaneous irradiation method, the reaction conditions have a complex effect on GMA grafting yield. Method such as FT-IR have been carried out to investigate the composition and structure of of sample solution on absorp grafting material. Effect factors such as pH, GMA grafting yield, volume tion have been studied.

关 键 词：纳米二氧化硅 共辐射接枝 甲基丙烯酸缩水甘油酯 

分 类 号：TB384[一般工业技术—材料科学与工程]