遮阴后不同小麦品种(系)旗叶光系统Ⅱ(PSⅡ)对强光的响应  

Response of PSⅡ in Shaded Flag Leaves of Two Wheat Cultivars to High Light

作　　者：郭峰[1] 田纪春[2] 孟庆伟[1] 赵世杰[1] 

机构地区：[1]山东农业大学生命科学学院/作物生物学国家重点实验室,山东泰安271018 [2]山东农业大学农学院,山东泰安271018

出　　处：《山东农业科学》2008年第8期40-43,共4页Shandong Agricultural Sciences

基　　金：山东省农业良种工程重大课题[鲁农良种字(2006)6号]

摘　　要：以两个小麦品种(系)01-35和L-14为材料,通过测定强光处理后叶片的叶绿素荧光诱导动力学曲线,研究了强光对不同光强下生长的小麦叶片光系统Ⅱ的影响。结果表明,遮阴下生长的小麦01-35强光处理后其PSⅡ只有受体侧受到伤害,而L-14叶片PSⅡ的供体侧、受体侧和反应中心都受到伤害。因此,01-35在遮阴解除后对强光的耐受性更强。The effect of high light on PS II of two wheat cultivars grown in shade and full sunlight were investigated by measuring chlorophyll fluorescence kinetics after high light treatment for 3 hours. The results showed that only acceptor side of PS Ⅱ in shaded 01 - 35 leaves was damaged by light stress, but the damage of reaction centers, donor and acceptor sides were all found in shaded leaves of L - 14. Therefore, 01 - 35 was more tolerant to light stress after shade was removed.

关 键 词：小麦 PSⅡ 强光胁迫 叶绿素荧光 

分 类 号：S436.421.19[农业科学—农业昆虫与害虫防治]