多弧离子镀(Ti,Al,Cr)N硬质膜的沉积工艺与力学性能  

Deposition Process and Mechanical Properties of(Ti,Al,Cr)N Films Deposited by Multi Arc Ion Plating

作　　者：王闯[1] 张钧[1] 

机构地区：[1]沈阳大学,沈阳110044

出　　处：《微细加工技术》2008年第5期16-18,34,共4页Microfabrication Technology

基　　金：辽宁省高等学校优秀人才支持计划资助(RC-05-05)

摘　　要：采用多弧离子镀技术并使用合金靶制备(Ti,Al,Cr)N多组元硬质膜。利用扫描电镜、X射线衍射仪对(Ti,Al,Cr)N膜层表面及断面形貌、成分、结构等进行观察测定,系统考察了沉积工艺对(Ti,Al,Cr)N膜层质量、硬度、膜/基结合力的影响,通过与Ti N,(Ti,Al)N和(Ti,Cr)N等硬质膜进行比较,发现采用Ti-Al-Cr合金靶所制备的(Ti,Al,Cr)N硬质膜具有更高的硬度和更好的附着力,同时对沉积工艺有较强的适应性。（ Ti, Al, Cr） N multi-component super-hard reactive films were prepared by multi arc ion plating （MAIP） technology using Ti- Al-Cr alloy targets. The surface and cross-fracture morphology, the surface compositions and the phase structure of the as-deposited films were observed and measured by scan electronic microscope （SEM） and X-ray diffraction （XRD）. The effects of the deposition process on the fihn quality, the micro-hardness of the films and the adhesion between film and substrate were systemically investigated. In comparison with TiN, （ Ti, Al） N, （ Ti, Cr） N films, the as-deposited （ Ti, Al, Cr） N films from the Ti-Al-Cr alloy targets exhibited higher micro-hardness and the better adhesion together with adaptability to deposition process.

关 键 词：(Ti Al Cr)N硬质膜 多弧离子镀 显微硬度 附着力 合金靶 

分 类 号：TN304.055[电子电信—物理电子学]