空间RB-SiC反射镜的表面离子辅助镀硅改性技术  

IAD-Si modification on RB-SiC space mirror for super-polished surface

作　　者：徐领娣[1,2] 郑立功[1] 范镝[1] 张学军[1] 王加朋[1,2] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,吉林长春130033 [2]中国科学院研究生院,北京100049

出　　处：《光学精密工程》2008年第12期2497-2502,共6页Optics and Precision Engineering

基　　金：国家杰出青年基金资助项目(No.69925512)

摘　　要：针对空间相机用反射镜RB-SiC材料由Si\SiC两相结构引起的光学表面缺陷问题,提出了表面离子辅助沉积(IAD)硅膜的改性新方案以优化RB-SiC光学表面反射率。对厚度为10±0.5μm的IAD-Si改性层的主要性能研究显示:IAD-Si膜层为非结晶结构,能够提供较好的抛光表面,在77～673K的热冲击下膜层稳定性良好。以Si膜的抛光机理为依据,对IAD-Si改性层进行了大量抛光工艺实验和表面质量测试,给出了关键的抛光工艺参数和实验结果。通过表面IAD-Si改性及本文提出的改性层超精加工技术能够在反射镜表面得到面形精度RMS值优于1/20λ(λ=632.8nm)且表面粗糙度RMS值<0.5nm的超光滑表面;与改性前相比,反射镜改性层抛光表面在360～1100nm波段的反射率提高了4.5%以上。To eliminate surface limitation caused by Silicon impurity in RE-SiC apace mirrors, a relatively thick Si film is deposited on well finished RB-SiC substrate by ion assisted depositing （IAD） process to provide a better polishable surface. Firstly,The process of RE-SiC surface coating is summarized, on the polishing point of view. Secondly, several properties of IAD-Si coatings were tested. Results show that the amorphous film can satisfy all requirements of RE-SiC surface coating technique. Then, polishing experiments on 10±0.5 μm thick IAD-Si layers were accomplished and testing results of surface roughness and reflectivity were given： surface roughness of the coating after polished achieved less than 0. 5nm RMS reflectivity of IAD-Si polished surface with reflective films increased up to 4.5% than that of RE-SiC in 360- 1 100 nm wavelength. The results indicated that IAD-Si coating technique and the new polishing process showed an access to high quality RE-SiC space mirrors.

关 键 词：反应烧结碳化硅 表面改性 离子辅助沉积硅 表面反射率 

分 类 号：TH703[机械工程—仪器科学与技术] O484.1[机械工程—精密仪器及机械]