磁流变抛光高精度光学表面中的工艺参数(英文)  

Polishing Parameters of Magnetorheological Finishing for High-Precision Optical Surfaces

作　　者：宋辞[1] 戴一帆[1] 彭小强[1] 

机构地区：[1]国防科学技术大学机电工程与自动化学院,长沙410073

出　　处：《纳米技术与精密工程》2008年第6期424-429,共6页Nanotechnology and Precision Engineering

基　　金：国家自然科学基金重点资助项目(50535020);新世纪优秀人才计划资助项目(NCET).

摘　　要：对磁流变抛光进行高精度光学表面加工中必须考虑和控制的7类参数,即磁流变液黏度、磁场强度、磁流变液流量、抛光轮转速、锻带厚度、切深以及抛光斑点特性进行分析和优化,得出单因素条件下材料的去除量总是同这7类参数的变化存在一定的内在联系.在分析和优化磁流变抛光过程中这些参数的基础上,采用自研的KDMRF-1000机床对一块K4材料口径100,mm的平面镜进行了抛光加工实验.经过两次循环大约200min的抛光后,面形误差值由最初的峰谷值(PV)为262,nm,均方根值(RMS)为49,nm收敛到最终的PV为55,nm,RMS为5.7,nm.实验中面形误差的收敛表明:只要掌握了磁流变抛光过程中的这7种参数的变化规律,就能充分利用磁流变抛光技术,为高精度光学表面的加工提供可靠的保障.Seven parameters, such as viscosity of magnetorheological （MR） fluid, intensity of magnetic field, flow rate of MR fluid, wheel speed, ribbon height, depth into ribbon and spot, which should be considered and controlled in the process of polishing high-precision optical surfaces with magnetorheological finishing （MRF）, are analyzed and optimized. Inherent relationship always exists between material removing and these seven parameters on the condition of single factor. Based on the analysis and optimization of these parameters in MRF process, one flat parr （K4, 100 mm in diameter）was polished by KDMRF-1000 that we developed before. After two iterations of polishing about 200 min, residual surface error decreased from peak-to-valley （PV） of 262 nm and root-mean-square （RMS） of 49 nm to PV of 55 nm and RMS of 5.7 nm. The convergence of surface error in the experiment illustrates that we can take full advantage of MRF technique and offer reliable insurance for finishing high-precision optical surfaces as long as we master the law for these seven parameters in the process of MRF.

关 键 词：磁流变抛光 光学平面 光学球面 高精度光学表面 

分 类 号：TG580.692[金属学及工艺—金属切削加工及机床]