非晶态碳膜的制备和性能  

The Preparation and Properties of Amorphous Carbon Film

作　　者：钱苗根[1] 蒋学渊[1] 

机构地区：[1]上海交通大学

出　　处：《机械工程材料》1990年第4期40-42,52,共4页Materials For Mechanical Engineering

摘　　要：报道了用射频等离子体化学气相沉积方法制备非晶态碳膜的实验结果。在适当的沉积条件下,该膜非常硬。它具有许多接近于金刚石的令人感兴趣的性能。最后对对非晶态碳膜的应用前景进行了讨论。In this paper the experimental resttIts for the amorphous carbon film produced by γf plasma enhanced CVD are reported. If made under appropriate deposition conditions the film are extremely hard. It possesses interesting properties approximate to those of diamond. Finally, the applications of the amorphous carbon film are discussed.

关 键 词：非晶态碳膜 制备 性能 

分 类 号：TH145[一般工业技术—材料科学与工程]