含阴离子官能团物质与蒙脱土的相互作用研究  

Interaction Between Anions and MMT

作　　者：郝慧[1] 郑俊萍[1] 陈昌策[1] 姚康德[1] 

机构地区：[1]天津大学材料科学与工程学院,天津300072

出　　处：《化学工业与工程》2009年第1期10-14,共5页Chemical Industry and Engineering

基　　金：国家自然科学基金资助项目(20204008)

摘　　要：通过研究不同电荷状态的含阴离子官能团物质与蒙脱土(MMT)复合物的插层情况来研究阴离子官能团与MMT的相互作用,利用FT-IR、XRD和NMR等手段对反应产物进行表征,以确定阴离子官能团与MMT的作用机理和作用位点。试验结果表明,羧酸基团与MMT有很强的相互作用。羧酸基团与MMT发生作用的位点是(—COO-)上的羰基(—CO),它与MMT上的(—OH)或Al3+发生作用。The mechanism of interaction between anions and MMT was studied by analyzing the different intercalation effect of organic anions matter in different state of c mechanism and the sites of interaction between anions and MMT, barges distribution. In order to ascertain the a combined characterization technique of FT- IR, XRD and NMR were used. The results indicate that carboxyl group is strongly interacted with MMT. The interactive sites between carboxyl matter and MMT is the carbonyl group （ --C=O ） of the carboxyl anion group （--COO-）, which interacts with the aluminium hydroxyl group or the aluminium ion.

关 键 词：阴离子 蒙脱土 插层 相互作用 

分 类 号：O648[理学—物理化学]