氮化碳晶体的热生长  

Thermal Growth of Carbon Nitride Crystal

作　　者：何孟兵[1] 彭友贵[1] 叶明生[1] 范湘军[1] 吴大维[1] 

机构地区：[1]武汉大学物理系

出　　处：《材料工程》1998年第3期9-10,16,共3页Journal of Materials Engineering

摘　　要：研究了真空热处理对非晶Ｃ３Ｎ４薄膜的晶化作用，Ｘ射线衍射（ＸＲＤ）谱和透射电镜选区电子衍射（ＴＥＤ）图象表明。The action of thermal post-treatment in vacuum on the crystallizing of amorphous carbon nitride thin film has been studied As Xray diffraction(XRD) spectrums and the transmission electron deffraction (TED) patterns indicated that the thermal posttreatment in vacuum does great benefit to the synthesis of βC3N4 crystal structure

关 键 词：氮化碳薄膜 真空热处理 晶体 热生长 超硬材料 

分 类 号：TQ163[化学工程—高温制品工业]