可见光响应型窄带隙半导体光催化材料的研究及应用进展  

Research and Applications of Visible Light Responsive Narrow Band Gap Semiconductor Photocatalytic Materials

作　　者：张彤[1] 张悦炜[1] 张世著[1] 陈冠钦[1] 洪樟连[1] 

机构地区：[1]浙江大学材料科学与工程学系,杭州310027

出　　处：《材料导报》2009年第3期24-28,共5页Materials Reports

摘　　要：近年来,窄带隙半导体材料因具有吸收太阳光可见波段能量、可见光催化降解有机物及可见光解水制氢的优异特性而成为新型半导体材料的研发热点。综述了以TiO2为代表的传统半导体材料掺杂体系以及全新组成材料体系等两大类具有窄带隙半导体特性的材料种类、光催化性能的影响因素、材料制备工艺以及应用前景,并在此基础上展望了研究与发展方向。In recent years, narrow band gap semiconductors have attracted extensive attention and become the research focus of the novel semiconductor materials because they are capable of absorbing the visible light, degrading the organic pollutants and producing dean energy by splitting the water into hydrogen and oxygen under visible light irradiation. In this paper the material classification, factors controlling the pbotocatalytic performance, material synthesis technique and future application of two kinds of materials with narrow band gap characters, the modified titania and new narrow band gap semiconductor are summarized. Finally, the development trend of their research and application is also discussed.

关 键 词：窄带隙半导体 可见光催化 可见光解水 带隙 制备工艺 

分 类 号：O614.411[理学—无机化学] TQ426.99[理学—化学]