基于膜系设计控制薄膜残余应力的研究  

Investigation on controlling residual thermal stress in thin films based on layer structure design

作　　者：夏志林[1] 薛亦渝[1] 郭培涛[1] 黄才华[1] 李展望[1] 傅志伟[1] 

机构地区：[1]武汉理工大学材料科学与工程学院,湖北武汉430070

出　　处：《真空》2009年第1期22-25,共4页Vacuum

基　　金：国家自然科学基金资助项目(10804090);武汉理工大学校自由探索基金资助项目(XJJ2007031);博士科研启动基金(471-38650322)

摘　　要：残余应力大的薄膜,容易产生脱膜现象,使得薄膜失去所需功能。在激光薄膜领域,残余应力也是薄膜激光损伤阈值难以提高的原因之一。基于热收缩效应模型和弹性力学原理,从薄膜膜系着手提出了控制薄膜残余热应力的膜系设计原则,将该原则的评价函数用于薄膜膜系设计中,采用优化方法可以设计出残余热应力可接受的薄膜。The high residual stress in thin films tends to decoating, thus causing the films to lose the functions the films should keep on. For the the laser-deposited films, the residual stress in films make them difficult to raise the threshold value above which the films will be damaged due to ldser irradiation. Based on the pyrocondensation model and principles of elasticity, the layer structure design of thin films was proposed in view of the control of residual thermal stress and the corresponding evaluation function was applied to the layer structure design of films. As a result, the films in which the residual thermal stress is acceptable are designed via optimization.

关 键 词：光学薄膜 残余热应力 膜系设计 有限元模拟 

分 类 号：TB43[一般工业技术] O484[理学—固体物理]