钨离子掺杂对钛片表面TiO_2薄膜光催化活性的影响  

Influence of W^(0+) doping on photocatalytic activity of TiO_2 thin film on titanium surface

作　　者：陈建华[1] 冯娟娟[1] 刘自力[2] 

机构地区：[1]广西大学资源与环境学院,广西南宁530004 [2]广州大学化学与轻化工学院,广东广州510405

出　　处：《工业催化》2009年第1期63-67,共5页Industrial Catalysis

基　　金：国家自然科学基金资助项目(20466001)

摘　　要：采用溶胶-凝胶法制备了负载在钛片上掺杂W^(6+)的TiO_2薄膜光催化剂。研究结果表明,焙烧温度为520℃,TiO_2薄膜光催化剂活性最好;W6^(6+)的掺杂提高了TiO_2薄膜的光催化活性。当W^(6+)掺杂浓度为6.04×10^(16)个·cm^(-3)时,W^(6+)-TiO_2薄膜光催化剂光催化活性最高,XRD结果表明,掺杂W^(6+)前后TiO_2均为锐钛矿相,并未检测出任何钨的氧化物。Titania thin film doped with W^6＋ and supported on titanium surface were prepared by sol-gel method. The results indicated that optimum photocatalytic activity of the TiO2 thin film was attained under calcination temperature of 520 ℃ ; doping of W enhanced photocatalytic activity of the TiO2 thin film. Optimal photocatalytic activity of the TiO2 thin fihn doped with W^6＋ was obtained at W^6＋ concentration of 6.04 ×10^16 atoms · cm^-3. XRD results showed that both pure and ion-doped TiO2 thin films were of anatase type, with no tungsten oxides detected.

关 键 词：催化化学 TIO2薄膜 光催化 溶胶-凝胶法 离子掺杂 

分 类 号：O644[理学—物理化学] TB383[理学—化学]