Pulsed-Laser Annealing of NiTi Shape Memory Alloy Thin Film  

作　　者：S.K. Sadrnezhaad E. Rezvani S. Sanjabi A.A. Ziaei Moayed 

机构地区：[1]Materials and Energy Research Center, P.O. Box 14155-4777, Tehran, Iran [2]Department of Materials Science and Engineering, Sharif University of Technology, P.O. Box 1156-9466, Tehran, Iran [3]Department of Materials Science and Engineering, Tarbiat Modarres University, P.O. Box 14115-143, Tehran, Iran

出　　处：《Journal of Materials Science & Technology》2009年第1期135-140,共6页材料科学技术（英文版）

摘　　要：Local annealing of amorphous NiTi thin films was performed by using an Nd：YAG 1064 nm wavelength pulsed laser beam. Raw samples produced by simultaneous sputter deposition from elemental Ni and Ti targets onto unheated Si （100） and Silica （111） substrates were used for annealing. Delicate treatment with 15.92 W/mm^2 power density resulted in crystallization of small spots; while 16.52 and 17.51 W/mm^2 power densities caused ablation of the amorphous layer. Optical microscopy, scanning electron microscopy, X-ray diffraction and atomic force microscopy were performed to characterize the microstructure and surface morphology of the amorphous/crystallized spot patterns.Local annealing of amorphous NiTi thin films was performed by using an Nd：YAG 1064 nm wavelength pulsed laser beam. Raw samples produced by simultaneous sputter deposition from elemental Ni and Ti targets onto unheated Si （100） and Silica （111） substrates were used for annealing. Delicate treatment with 15.92 W/mm^2 power density resulted in crystallization of small spots; while 16.52 and 17.51 W/mm^2 power densities caused ablation of the amorphous layer. Optical microscopy, scanning electron microscopy, X-ray diffraction and atomic force microscopy were performed to characterize the microstructure and surface morphology of the amorphous/crystallized spot patterns.

关 键 词：Local heat treatment NiTi thin film Pulsed laser annealing Amorphous/crystallized spot composite 

分 类 号：TG146.23[一般工业技术—材料科学与工程] TG146.263[金属学及工艺—金属材料]