Self-assembled monolayers of stearic imidazoline on copper electrodes detected using electrochemical measurements, XPS, molecular simulation and FTIR  

作　　者：LIU XiuYu MA HouYi MIAO Shuai ZHOU Min 

机构地区：[1]New Material Institute of Shandong Academy of Sciences, Jinan 250014, China [2]Department of Chemistry, Shandong University, Jinan 250100, China

出　　处：《Chinese Science Bulletin》2009年第3期374-381,共8页

基　　金：Supported by the National Natural Science Foundation of China (Grant No. 20573069)

摘　　要：A type of imidazoline inhibitor was synthesized using stearic acid and diethylenetriamine (DETA) as raw materials. Self-assembled monolayers (SAMs) of stearic imidazoline (IM) were prepared on copper surface. The copper electrode modified by IM was detected by electrochemical impedance spectros- copy (EIS),Tafel polarization curves, X-ray photoelectron spectroscopy (XPS) and Fourial transform reflection spectroscopy (FTIR). The biggest inhibition efficiency for copper corrosion of IM was 99% in NaCl solution according to EIS results. The XPS results provided evidence that the IM was adsorbed on copper surface. The theoretical calculations of molecular simulation supported the experimental re- sults and showed that the IM molecules were tilted at an angle to the copper surface.A type of imidazoline inhibitor was synthesized using stearic acid and diethylenetriamine （DETA） as raw materials. Self-assembled monolayers （SAMs） of stearic imidazoline （IM） were prepared on copper surface. The copper electrode modified by iM was detected by electrochemical impedance spectroscopy （EIS）, Tafel polarization curves, X-ray photoelectron spectroscopy （XPS） and Fourial transform reflection spectroscopy （FTIR）. The biggest inhibition efficiency for copper corrosion of IM was 99% in NaCI solution according to EIS results. The XPS results provided evidence that the IM was adsorbed on copper surface. The theoretical calculations of molecular simulation supported the experimental results and showed that the IM molecules were tilted at an angle to the copper surface.

关 键 词：铜 自组合单层 电气化学 光谱学 

分 类 号：O646[理学—物理化学]