二次曝光法测量物体位移和形变的改进  

Improvement by Double Exposure Measure Displacement and Deformation of Objects

作　　者：邹凯[1] 

机构地区：[1]泸州医学院生物医学工程系,四川泸州646000

出　　处：《江西师范大学学报（自然科学版）》2008年第6期720-723,共4页Journal of Jiangxi Normal University(Natural Science Edition)

摘　　要：提出一种单灵敏度下的二次曝光测位移.它把通常数字全息测量位移或形变中采用的平行参考光改为点源参考光,在一个观察方向上记录两张数字全息图,对应于物体位移前后的状态,并计算出它的离面位移和面内位移.A method of single sensitivity is proposed to the displacement＇ s measurement of double exposure. Spotlight is used instead of parallel light which is usually used in the digital holography measurement of displacement or deformation, in a direction of observation two digital holograms corresponding to the status of objects before and after displacement are recorded, and calculation of its displacement from the surface and in-plane displacement is done.

关 键 词：无损检测 数字全息 二次曝光 点光源 

分 类 号：O432.2[机械工程—光学工程]