光刻胶全息光栅显影监测的模拟与实验  

Simulation and experiments of monitoring curves on development of holographically recorded photoresist gratings

作　　者：陈刚[1] 吴建宏[2] 刘全[2] 陈新荣[2] 李朝明[2] 

机构地区：[1]南京信息职业技术学院微电子工程系,南京210046 [2]苏州大学信息光学工程研究所,苏州215006

出　　处：《光学技术》2009年第1期41-44,共4页Optical Technique

基　　金：江苏省高技术研究计划资助项目(BG2004020);江苏省高校自然科学重大基础研究资助项目(07KJA51002)

摘　　要：为了控制光刻胶全息光栅显影过程,建立了槽形演化和衍射效率模型,模拟了槽形演化和衍射效率曲线,分析了显影监测曲线的特征和规律。并将模拟槽形和实验槽形、模拟监测曲线和实验监测曲线进行对比,均很好地吻合。结果表明衍射效率的监测对把握显影过程停显时刻、控制掩摸槽形非常有效。In order to control the development of the holographically recorded grating of photoresist, the profile evolution and diffraction curve are simulated and characteristics and law of the diffraction curve are analyzed. The simulations are compared with experiments, and good agreements are achieved. Both experiments and simulations prove that diffraction monitoring is highly effective in determinating the terminal time of development and in shaping the final profile of grating.

关 键 词：信息光学 全息光栅 槽形模拟 显影监测 

分 类 号：O436.1[机械工程—光学工程]