飞行器隐身测试用低散射塔架结构及其制造工艺  

Low-Scattering Pylon Structure Used in Stealth Property Measurement of Aircraft and Its Manufacture Technology

作　　者：焦洪杰[1] 陈五一[1] 张以都[1] 

机构地区：[1]北京航空航天大学机械工程及自动化学院

出　　处：《航空制造技术》2009年第4期86-89,共4页Aeronautical Manufacturing Technology

摘　　要：根据目标支撑塔架的结构特点及基本性能要求,给出了一般制造工艺流程,详细论述了制造低散射塔架的完整工艺路线及具体措施,并分析了改善性能的基本原理。Based on the structure characteristics and basic performance requirements of target support pylon, general manufacture technology process is presented. The concrete measure of target support pylon manufacture technology and whole craft course are discussed in detail and the basic law of improving performance is analyzed.

关 键 词：紧缩场 塔架 低散射 制造工艺 

分 类 号：V216.8[航空宇航科学与技术—航空宇航推进理论与工程]