氮化钛硬质薄膜的制备和性能分析  

Preparation and Analysis of the Property of the TiN Hard Coating

作　　者：陈甥怡[1] 赵广彬[1] 曹晓英[1] 罗德福[1] 张勇[1] 栾道成[1] 

机构地区：[1]西华大学材料科学与工程学院,四川成都610039

出　　处：《新技术新工艺》2009年第2期94-96,共3页New Technology & New Process

基　　金：四川省特种材料及制备技术重点试验室资助项目

摘　　要：研究热阴极离子镀设备制备TiN薄膜膜层的主要性能。采用自主研发的XH-830型热阴极离子镀膜机,在硬质合金ZK1基体上制备TiN薄膜;利用X射线衍射仪,自动划痕仪,显微硬度计和扫描电镜对薄膜进行了结构分析和性能检测。采用XH-830镀膜机能制备单一的TiN薄膜,膜层晶体为细小的柱状晶,膜-基结合力能达到81N,TiN硬度达到2240HV以上,经切削试验证明,能提高被镀刀片寿命30%。This paper Studies the HCD ion plating equipment of TiN film technology and the main properties of the films. By using self-made XH-830 HCD ion mechanism, hard carbide grade for ZK1 is deposited with TiN films. The XRD, bonding tester, microhardness tester and SEM use to investigate the mechanical property and microstructure of TiN films. The results show that： XH-830 HCD ion plating equipment can prepared TiN films; crystal grains are small cylindrical crystal; cohesion of substrate-film is 81N;micohardness is above 2240 HV; through cutting testing, service life of cutter deposited with TiN can be improved 30%.

关 键 词：TIN 薄膜 XRD 显微硬度 结合力 

分 类 号：TG174.444[金属学及工艺—金属表面处理]