电化学方法研究纯镁在薄液膜下的腐蚀行为Ⅰ-O_2对纯镁在薄液膜下腐蚀行为的影响  

CORROSION OF PURE MAGNESIUM UNDER THIN ELECTROLYTE FLIMS Ⅰ-INFLUENCE OF OXYGEN ON CORROSION OF PURE MAGNESIUM UNDER THIN ELECTROLYTE FILMS

作　　者：陈崇木[1] 崔宇 张涛 邵亚薇[1,2] 孟国哲 王福会 李晓刚[2,3] 董超芳[3] 

机构地区：[1]哈尔滨工程大学材料科学与化学工程学院腐蚀与防护实验室,哈尔滨150001 [2]中国科学院金属研究所金属腐蚀与防护国家重点实验室,沈阳110016 [3]北京科技大学腐蚀与防护中心,北京100083

出　　处：《腐蚀科学与防护技术》2009年第2期94-96,127,共4页Corrosion Science and Protection Technology

基　　金：国家自然科学基金项目(50601007)

摘　　要：用电化学法研究了纯镁在未除氧和除氧的下不同厚度薄液膜下的腐蚀行为.结果表明:薄液膜下纯镁腐蚀的阴极过程受氢还原控制;液膜厚度的减小使其阴极过程和阳极过程都受到抑制,对阳极过程影响很大.氧气的存在对阳极过程的影响很大,并使得纯镁表面易于生成表面膜,表面膜更加连续和致密.Corrosion behavior of pure magnesium was investigated by means of cathodic polanzation curve and electrochemical impedance spectroscopy （ EIS ） under aerated and deaerated thin electrolyte films （TEF） with various thicknesses. The experimental results revealed that the cathodic process of pure magnesium under thin electrolyte film was dominated by hydrogen reduction. With decreasing thickness of the thin electrolyte film, cathodic process was retarded slightly while the anodic process was inhibited significantly. It was easier to form a continuous and compact scale on the surface of pure magnesium with the presence of oxygen in the thin electrolyte film which has remarkable effect on the anodic process but little on the cathodic process.

关 键 词：纯镁 薄液膜 氧气 腐蚀 

分 类 号：TG172.3[金属学及工艺—金属表面处理]