AM60镁合金化学抛光的工艺及机理研究  

PROCESS AND MECHANISM OF CHEMICAL POLISHING OF AM60 MAGNESIUM ALLOY WITH A H_3PO_4 CONTAINING LIQUOR

作　　者：宋晓敏[1] 余刚[1] 何晓梅[2] 胡波年[2] 陈云[1] 张俊[1] 易海波[1] 

机构地区：[1]湖南大学化学化工学院,长沙410082 [2]湖南工学院化学化工系,衡阳421008

出　　处：《腐蚀科学与防护技术》2009年第2期206-208,共3页Corrosion Science and Protection Technology

基　　金：国家自然科学基金项目(50671036);湖南省自然科学基金项目(06JJ4013)

摘　　要：用在磷酸、丙二醇和水组成的抛光液中的失重率和磷化膜的盐水腐蚀实验以及电化学方法,研究了抛光工艺对AM60镁合金抛光效果、磷化膜耐蚀性的影响及AM60镁合金在磷酸系抛光液中的抛光机理.结果表明,用磷酸体积分数为60%～70%的抛光液,在温度40～50℃下抛光3～5min,得到了较好的抛光效果,同时提高了磷化膜的耐蚀性.A solution composed of phosphate acid, propanediol and deionized water was used to polish AM60 magnesium alloy. Polishing procedure and its mechanism was studied by measuring mass loss rate, immersion test in 3.5% NaCl solution and electrochemical test. Better polished effectiveness can be obtained by polishing at 40 -50℃ for 3 -5 min in the solution with 60% -65% volume fraction of 85% H3PO4,and thereby its corrosion resistance was improved.

关 键 词：镁合金 抛光 机理 磷化 耐蚀性 

分 类 号：TG174.44[金属学及工艺—金属表面处理]