薄膜蒸镀光学控制中一种现象的数学分析  

Mathematical Analysis of Phenomena Connected with the optical Monitoring in Thin—film Deposition

作　　者：洪冬梅[1] 朱震[1] 

机构地区：[1]华北光电技术研究所

出　　处：《激光与红外》1998年第2期119-121,共3页Laser & Infrared

摘　　要：证明了在连续蒸镀两层高、低折射率介质膜过程中，当第一层厚度不足／４厚时，刚开始蒸镀第二层膜时其反射率变化趋势与第一层膜相同。并由此展开，说明两层厚度不足／４的薄膜在很大程度上等价于一层／４厚的薄膜。It is demonstrated that when the deposi- tion of a layer with optical thickness of tess than quarter - wave is stopped , the reflection will initially continue to increase or decrease , when the depositon of a second layer is started. It is also shown that a combination of two dielectric layers ,each with an op- tical thickness of less than a quarter - wave lehaves to a great extent as one quarter - wave tayer.

关 键 词：等效λ/4膜 光学薄膜 薄膜蒸镀 

分 类 号：O484[理学—固体物理] TB43[理学—物理]