二氧化钒制备与应用的新进展  

Recent Progress in Fabrication and Application of VO_2

作　　者：康晓春[1] 赵颖[1] 王胤博[1] 杨修春[1] 

机构地区：[1]同济大学材料科学与工程学院,上海200092

出　　处：《材料导报（纳米与新材料专辑）》2008年第3期196-199,共4页

摘　　要：二氧化钒是一种性能优异的金属-半导体相变材料,其相变温度接近于室温,因此具有良好的应用前景。综述了二氧化钒粉体与薄膜的制备方法,系统地介绍了二氧化钒薄膜在各领域的研究进展,并展望了二氧化钒的研究前景。Vanadium dioxide （VO2） is one of the metal-semiconductor phase transition materials with excellent properties. Its phase transition temperature is near room temperature. Therefore, vanadium dioxide has good application prospect in modern industry. In this paper, the preparation methods of VO2 powder and thin films are described, and the recent research development of VO2 is reviewed in a systematic way. Finally, further key study areas and applications of VO2 are presented.

关 键 词：二氧化钒 制备 应用 

分 类 号：TB34[一般工业技术—材料科学与工程] TG139.6[金属学及工艺—合金]