Φ100mmY系高温超导靶材及制备工艺  

The Technology of Φ100mm Y System High-Tc Superconducting Target

作　　者：李艳红[1] 李建立[1] 刘景和[1] 张亮[1] 

机构地区：[1]长春光学精密机械学院材料与化工分院

出　　处：《长春理工大学学报（自然科学版）》2001年第1期8-11,共4页Journal of Changchun University of Science and Technology(Natural Science Edition)

基　　金："九五"国防科工委重点课题基金项目

摘　　要：本文利用固相反应成功地制备出直径Φ１００ｍｍ，厚度５ｍｍ的高质量超导靶材，超导靶材零电阻温度为９１Ｋ，同时对靶材原粉的要求和制靶工艺进行了分析。Ｘ射线衍射进行物相定性分析，扫描电镜进行形貌现察。用此靶材制备的超导薄膜，其零电阻温度在９０Ｋ，临界电流密度大于１０６／ｃｍ２，并用于制备超导电子器件。We have prepared high-quality superconducting target with 100mm in diameter and 5mm in depth by soid-state reaction, The zero-resistance temperature of superconductor is 91k, the require of powders and technology of target heve been analysed. X-ray diffraction is used for analysing, electronic-microscope sanning is used to observ superconductor. The target are used to prepare the superconducting film, the zero-resistance temperature of films is 90k, the maximum critical current density has reached 106A/cm2. they can be used to make a various of superconducting electroic elements.

关 键 词：超导靶材 零电阻温度 临界电流密度 超导薄膜 

分 类 号：TM26[一般工业技术—材料科学与工程]