EFFECT OF ACIDITY ON ACID-SENSITIVE UV CURING SYSTEM  

作　　者：洪啸吟 

机构地区：[1]Department of Chemistry, Tsinghua University, Beijing, 100084, China

出　　处：《Chinese Journal of Polymer Science》1999年第1期43-48,共6页高分子科学（英文版）

基　　金：This project was supported by the National Natural Science Foundation of China(59633110 and 59773007)

摘　　要：By using diphenyliodonium salts with different counterions as photo acid generators (PAGs), the effect of acidity on ring-opening polymerization of epoxy monomers and polycondensation of polyol with hexamethoxymethyl melamine (HMMM) was studied. The result shows that the rate of ring-opening polymerization is evidently dependent on the acidity of the acid and strong photo-generated acid is required. However, there is a leveling effect in the polycondensation system; if the photo-generated acid is stronger than protonated HMMM, the acidity does not obviously affect the polycondensation rate.By using diphenyliodonium salts with different counterions as photo acid generators (PAGs), the effect of acidity on ring-opening polymerization of epoxy monomers and polycondensation of polyol with hexamethoxymethyl melamine (HMMM) was studied. The result shows that the rate of ring-opening polymerization is evidently dependent on the acidity of the acid and strong photo-generated acid is required. However, there is a leveling effect in the polycondensation system; if the photo-generated acid is stronger than protonated HMMM, the acidity does not obviously affect the polycondensation rate.

关 键 词：photo acid generator UV curing polyaddition system polycondensation system 

分 类 号：TQ316.341[化学工程—高聚物工业]