Studies on the Syntheses and Properties of UV-sensitive Organosilicon Monomers and Polymers  

作　　者：Zhuo Renxi and Lou Xia(Department of Chemistry, Wuhan University, Wuhan) 

出　　处：《Chemical Research in Chinese Universities》1989年第1期97-103,共7页高等学校化学研究（英文版）

摘　　要：Photosensitive organosilicon monomers and polymers containing furylacrylate, cinnamate or methacrylate groups were synthesized. The chemical structure of these organosilicon monomers were confirmed by 1H NMR and elemental analysis.The curing rates of these photosensitive polysiloxanes were also determined, all of them show a good UV-sensitivity. The UV-sensitivity of polysiloxanes containing pendent furylacrylates are comparable to that of polysiloxanes with either pendent cinnamate or pendent methacrylate groups.Photosensitive organosilicon monomers and polymers containing furylacrylate, cinnamate or methacrylate groups were synthesized. The chemical structure of these organosilicon monomers were confirmed by 1H NMR and elemental analysis.The curing rates of these photosensitive polysiloxanes were also determined, all of them show a good UV-sensitivity. The UV-sensitivity of polysiloxanes containing pendent furylacrylates are comparable to that of polysiloxanes with either pendent cinnamate or pendent methacrylate groups.

关 键 词：Photosensitive polysiloxanes UV-CURING Furylacrylates CINNAMATES METHACRYLATES 

分 类 号：O6[理学—化学]