纳米二氧化硅改性及其在硅类消泡剂中的应用  

NANO-SILICA SURFACE MODIFICATION AND APPLICATION IN SILICONE DEFOAMER

作　　者：郭锟[1] 安秋凤[1] 李明涛[1] 李歌[1] 

机构地区：[1]陕西科技大学化学与化工学院,陕西西安710021

出　　处：《精细石油化工》2009年第2期60-65,共6页Speciality Petrochemicals

基　　金：陕西省科学技术研究发展计划项目(2006K07-G22);陕西科技大学创新团队项目(SUST-B23);陕西省教育厅产业化项目(075C04)。

摘　　要：利用硅烷偶联剂十二烷基三甲氧基硅烷(WD-10)对纳米SiO_2进行了有机表面接枝改性。采用红外光谱、电泳、热重分析、扫描电镜等分析手段对表面改性前后的纳米SiO_2进行表征,考察了反应温度、反应时间和偶联剂浓度对接枝率的影响。结果表明:WD-10以化学键合的方式结合在纳米SiO_2的表面,形成有机包覆层,明显改善其分散性能;在WD-10质量浓度为0.9 mL/g、反应温度60℃、反应时间1 h时,接枝率最高。在消泡剂体系中添加4%经改性后的纳米SiO_2进行乳化可明显改善消泡剂的破泡性能和稳定性。The nano-silica surface was modified with silane coupling reagent WD-10. The prepared samples were characterized by FT-IR, SEM, TG and zeta potential techniques, and the influences of temperature, time and concentration on the properties of the products were studied. The results showed that WD - 1 0 is bound on the surface of nano - silica particles and an organic coating layer is formed, which eentration of O. results showed is added in the improves the dispersivity; grafting efficiency reaches the maximum at the WD-10 concentratioon 9 mL/g, reaction time of 1 h and reaction temperature of 60 ℃.The property testing that the stability and defoaming ability is markedly improved when 4% modified silica deformer.

关 键 词：纳米二氧化硅 接枝改性表征 消泡剂 十二烷基三甲氧基硅烷 

分 类 号：TQ264.1[化学工程—有机化工]