表面等离激元体干涉制备纳米光子晶体的模拟分析  

Photonic Crystal Fabrication Based on Surface Plasmon Polaritons Interference Nanolithography

作　　者：金凤泽[1] 方亮[1] 张志友[1] 杜惊雷[1] 郭永康[1] 

机构地区：[1]四川大学物理科学与技术学院,四川成都610064

出　　处：《光学学报》2009年第4期1075-1078,共4页Acta Optica Sinica

基　　金：国家自然科学基金(6067602;60878031);教育部博士点基金(20060610006)资助

摘　　要：利用表面等离激元短波长和近场增强效应的特性,用多束p偏振态相干光激发表面等离激元(SPPs),并优化干涉光刻的曝光参数,可获得高分辨率、高对比度周期性纳米结构。阐述了多束SPPs干涉法制备纳米光子晶体的原理,并得到了干涉场强度分布随光束增加的关系。随着干涉SPPs数目的增加,干涉场会复杂变化,对此进行了计算机模拟。模拟了三束SPPs和六束SPPs干涉的强度分布,并分析了调制技术干涉曝光结果。该方法适合光电子器件中大范围亚波长的周期性孔阵或点阵结构的制作以及纳米量级光子晶体的的制作,并可以有效降低制作成本。Through multi-beam coherent surface plasmon polaritons （SPPs） excited by p-polarized light beams, and optimizing exposal parameter of interference lithography, high resolution and contrast periodicity nanometer structure is obtained by using the features of short wavelength and near-field enhanced effect. The principle for nanometer photon-crystal fabrication by the method of multi-beam coherent SPPs intervening is expatiatedon. The relation between the magnetic-field distribution and the light beam number is conducted. The interference field tends complicated with the rise of beam numbers, and the simulation results are given. The intensity distributions of tribeam SPPs interference and exposure with six-beam SPPs interference are simulated, and the results of interferential exposure about modulation technology are analyzed. The method is suitable for fabricating nanometer photonic crystal and deep sub-micrometer periodic patterns in large field size used in opto-eletronical components, and it can reduce cost effectively.

关 键 词：光子晶体 表面等离激元 多束SPPs干涉 纳米光子晶体 

分 类 号：O436.1[机械工程—光学工程]