Catalyst Enhanced Chemical Vapor Deposition of Nano-Particle Nickel Films on Teflon Surface  

作　　者：LIU Endong FENG Wenfang ZHOU Jinlan YU Kaichao 

机构地区：[1]College of Resources and Environmental Engineering, Wuhan University &Technology, Wuhan 430070, Hubei, China [2]Department of Chemistry, Huazhong University of Science and Technology/Hubei Key Laboratory of Materials Chemistry and Service Failure, Wuhan 430074, Hubei, China

出　　处：《Wuhan University Journal of Natural Sciences》2009年第2期179-182,共4页武汉大学学报（自然科学英文版）

基　　金：Supported by the National Natural Science Foundation ofChina (40172018, 20275011)

摘　　要：Films formed with nanosized nickel particles on teflon surface were prepared by means of catalyst enhanced chemical vapor deposition （CECVD） with Ni（dmg）2, Ni（acac）2, Ni（hfac）2, Ni（TMHD）2, and Ni（cp）2 as precursors, and complexes Pd（hfac）2, PdC12 and Pd（η^3-2-methylallyl）acac as catalyst under cartier gas （H2）. The film growth rate depends on the precursors and substrate temperature. The chemical value, purity and surface morphology of the Ni particle films were characterized by X-ray photoelectron spectroscopy （XPS） and scanning electron microscopy （SEM）. The films obtained were shiny with silvery color, and consisted of grains with a particle size of 50-140 nm. The Ni was metallic of which the purity was about 90%-95% from XPS analysis. SEM micrograph showed that the film had good morphology.Films formed with nanosized nickel particles on teflon surface were prepared by means of catalyst enhanced chemical vapor deposition （CECVD） with Ni（dmg）2, Ni（acac）2, Ni（hfac）2, Ni（TMHD）2, and Ni（cp）2 as precursors, and complexes Pd（hfac）2, PdC12 and Pd（η^3-2-methylallyl）acac as catalyst under cartier gas （H2）. The film growth rate depends on the precursors and substrate temperature. The chemical value, purity and surface morphology of the Ni particle films were characterized by X-ray photoelectron spectroscopy （XPS） and scanning electron microscopy （SEM）. The films obtained were shiny with silvery color, and consisted of grains with a particle size of 50-140 nm. The Ni was metallic of which the purity was about 90%-95% from XPS analysis. SEM micrograph showed that the film had good morphology.

关 键 词：catalyst enhanced chemical vapor deposition TEFLON nano-particle nickel film 

分 类 号：O484.1[理学—固体物理] TQ426.65[理学—物理]