聚天冬氨酸与钨酸钠复配对黄铜缓蚀作用的光电化学研究  

Photoelectrochemical Study on the Complex of Poly-aspartate and Tungstate as Inhibitors against Brass Corrosion

作　　者：徐群杰[1] 单贞华[1] 朱律均[2] 曹为民[2] 周国定[1] 

机构地区：[1]上海高校电力腐蚀控制与应用电化学重点实验室上海电力学院,上海200090 [2]上海大学化学系,上海200444

出　　处：《化学学报》2009年第7期618-622,共5页Acta Chimica Sinica

基　　金：国家自然科学基金(No.20406009);上海市教委重点(No.06ZZ67);上海市重大科技攻关计划(No.062312045);上海市科委(Nos.08DZ2201400,08DZ2210800);上海市重点学科(No.P1304)资助项目.

摘　　要：应用光电化学的方法研究了两种环境友好型缓蚀剂聚天冬氨酸(PASP)和钨酸钠(Na2WO4)的单一配方及其复配对黄铜在含硼砂硼酸缓冲溶液的模拟水中的缓蚀作用.结果表明,在光电流循环伏安测试中,单一的PASP与Na2WO4均能够使黄铜表面Cu2O膜引起的p-型光电流响应增大,这说明缓蚀剂增大了Cu2O膜的厚度,使黄铜的腐蚀速率减小.单一的PASP与Na2WO4的最佳添加浓度分别为20与25mg·L-1.若以总浓度为20mg·L-1时对两者进行复配,当PASP与Na2WO4的质量比为1∶1时,两者复配比单一使用时的p-型电流光响应都更大,黄铜的腐蚀更小,即缓蚀剂的效果更好.Photoelectrochemical and electrochemical impedance measurements were conducted to study the effects of environment-friendly inhibitors poly-aspartate （PASP）, Na2WO4 and their complexes on the corrosion of brass in a borax-buffer solution. The photoelectrochemical measurement results indicated that PASP or Na2WO4 increased the p-type photocurrent, which came from the Cu2O layer on the brass surface. It showed that the inhibitors increased the thickness of the Cu2O layer and decreased the corrosion rate. The optimal concentrations of PASP and Na2WO4 were 20 and 25 mg·L^-1, respectively, and mono Na2WO4 increased much photocurrent than mono PASP did. Combining PASP and NazWO4 at a total concentration of 20 mg·L^-1, when the mass ratio （PASP ： NazWO4） was 1 ： 1, the photocurrent increased more than that using the individual. The bigger the photocurrent was, the better the inhibition efficiency was.

关 键 词：黄铜 钨酸钠 聚天冬氨酸 光电化学 腐蚀 

分 类 号：TG174.1[金属学及工艺—金属表面处理]