气相色谱/质谱法测定三氟化氮中痕量一氧化二氮  

Determines Trace Nitrogen Monoxide in Nitrogen Trifluoride by Gas Chromatography-Mass Spectrometry

作　　者：韦桂欢[1] 张洪彬[1] 龙庆云[1] 李杰[1] 

机构地区：[1]中国船舶重工集团公司第七一八研究所,河北邯郸056027

出　　处：《低温与特气》2009年第2期29-31,共3页Low Temperature and Specialty Gases

摘　　要：建立了测定高纯三氟化氮(NF3)气体中痕量一氧化二氮(N2O)的选择离子监测(SIM)方式的气相色谱/质谱法。采用Porapak Q PLOT毛细管色谱柱(30m×0.32mm×5μm),以m/z=44作为定量选择离子。同时考察了NF3工艺气物流对所选离子的测定干扰情况。方法在浓度为(5～100)×10-6(摩尔分数)范围内与峰面积呈线性关系,线性相关系数r=0.999,最低检测限为1×10-6(摩尔分数)。平均加标回收率为90.20%～97.05%,测定相对标准偏差(RSD)<5.33%。A new method for the determination of the trace nitrogen monoxide in high purity nitrogen trifluoride gas by gas chromatography-mass spectrometry selected ion monitoring（SIM） mode was established. The analysis was carried out on a Porapak Q PLOT capillary column （ 30 m × 0.32 mm × 5 μm ）. The quantitative selected ion is 44. The interference to the determination of selected ion was studied. The linear range was for 5.0 × 10^-6 to 100 × 10^-6 with relative coefficient of 0. 999. The mininum detection limit was 1 × 10^-6. The average recovery was 90. 2% -97.05%. The relative standard deviations （RSD） of nitrogen monoxide was less than 5. 33% .

关 键 词：气相色谱/质谱法 测定 三氟化氮 一氧化二氮 

分 类 号：O659[理学—分析化学]