特高压电容器用电极箔腐蚀工艺的研究  

Study on etching process of special high voltage anodic foil for aluminum capacitor

作　　者：迟慧 洪涛 邹道兵 

机构地区：[1]新疆众和股份有限公司,新疆乌鲁木齐830013

出　　处：《电子元件与材料》2009年第5期58-61,共4页Electronic Components And Materials

摘　　要：通过对特高压(Vfe=950V)电容器用电极箔微观形貌的理论计算,采用一次腐蚀控制孔密度和孔长度参数,二次腐蚀控制相应的孔径。研究了700～1100V特高压电极箔的两次电化学腐蚀工艺。使Vfe为950V的特高压电容器用电极箔的参数指标得到了优化:孔密度为0.116个/μm2,孔径为2.02μm,比容达到0.210×10–6F/cm2。The theoretical values of parameters were calculated by the characteristic micro-morphology for special voltage （Vfe=950 V） of aluminum capacitor, then the density and length of pits were controlled by the first electric process and the diameter of pits was controlled by the second electric process. The two-step etching of high purity aluminum foil for special voltage （700-1100 V） of aluminum capacitor was studied. An etching of high purity aluminum foil for super voltage （Vfe= 950 V） of aluminum capacitor is optimized, the density of pit is 0.116 unit/μm^2 and the diameter of pit is 2.02 μm. The specific capacitance reaches 0.210 × 10^-6 F/cm^2.

关 键 词：特高压 电容器 铝电极箔 直流腐蚀工艺 

分 类 号：TM535[电气工程—电器]