利用Langmuir技术构筑的光抗蚀剂聚合物纳米薄膜的表面微观结构及在光刻蚀方面的应用(Ⅰ):气液界面上聚合物单分子膜表面行为的研究  

Molecular Arrangements and Photopatterning of Polymer Photoresists in Ultrathin Nanosheets by Langmuir Technique(Ⅰ): Surface Behavior of Polymer Langmuir Monolayer at Air/Water Interface

作　　者：许文俭[1] 李铁生[1] 任方方[1] 吴养洁[1] 

机构地区：[1]郑州大学化学系,郑州450052

出　　处：《中州大学学报》2009年第2期103-107,共5页Journal of Zhongzhou University

基　　金：河南省自然科学基金(0611020100);河南省杰出人才创新基金(074100510015)

摘　　要：合成了含有缩酮保护基团的共聚物聚N-十二烷基丙烯酰胺/1.4-二噁螺环[4,4]壬烷-2-亚甲基甲基丙烯酸酯pDDMA/DNMMA,并用Langmuir技术构建了单层和多层纳米超薄膜,用表面压(π)和静态弹性模量(Es)随平均重复单元面积(A)的变化研究了聚合物在气/液界面上的表面行为。研究结果表明,共聚物pDDMA/DNMMA能在水面上紧密排列,形成稳定的分子取向规整的Langmuir分子膜,其单层膜的厚度为1.6nm;分子的主链平躺在水面上,分子的侧链基团以与水面呈62°夹角向上伸展。与π-A曲线相比,Es-A曲线能更清楚直观地反映单分子层在挤压过程中微观结构的变化。Es-π曲线的研究为优化拉膜工艺条件提供了可靠依据。排列紧密的单分子膜在一定的表面压下,可单层、多层均匀的转移到固体基板上,形成规整有序层状结构的LB膜。A novel series of ketal - protected copotymer, poly （ N - dodecylmethacrylamide - co - 1,4 - dioxaspiro [ 4.4 ] nonane - 2 - methyl methaerylate） p （ DDMA - DNMMA）, were synthesized, and their monolayer and muhilayer nanosheets were deposited by Langmuir - Blodgett （LB） technique. The surface behavior of the copolymer monolayer at the air/water interface was investigated by measuring the surface pressure （π） and the static elasticity （Es） as a function of mean repeat area （A） isotherm. The results showed that p （DDMA -DNMMA） could form the stable, well - defined molecular orientation Langmuir monolayer on the water surface, which was further proved by the measurements of the atomic force microscopy （AFM）. The polymer main chain lies flat on a water surface and the side chains attached to the main chain stretch out at the angle of about 62°. Condensed monolayer were transferred onto solid substrates at a given surface pressure, forming regular homogeneous Y - type LB films. UV - visible absorption spectra indicated that the well - ordered layer - by - layer structure was successfully controlled in the LB films.

关 键 词：LANGMUIR膜 LB膜 单分子层 光抗蚀剂 

分 类 号：O647.2[理学—物理化学] TB43[理学—化学]