在A-SNOM中L-V形纳米小孔的优化设计  

Optimal design of L-shaped and V-shaped apertures in the A-SNOM

作　　者：王国军[1] 吴世法[1] 李旭峰[1] 徐晨彪[1] 潘石[1] 

机构地区：[1]大连理工大学物理与光电工程学院,辽宁大连116024

出　　处：《电子显微学报》2009年第2期122-126,共5页Journal of Chinese Electron Microscopy Society

摘　　要：采用时域有限差分法对L形和V形纳米小孔进行优化设计。结果表明,两种小孔的出射峰值光强均比具有相同开孔面积的方孔提高了两个数量级。发现在具有相近峰值光强的情况下,且在距离出射面小于60nm的范围内,V形孔光斑尺寸在x方向和y方向的宽度可以比L形孔的光斑小10～15nm。本文对优化设计L形和V形小孔在纳米显微、光存储、光刻、光学操作等近场光学应用领域方面,具有一定的指导意义。The L-shaped and V-shaped apertures in a thick metallic screen are optimized by the method of finite-difference time-domain （FDTD）. The calculation result reveals that both of the light intensity peak of the two kinds of apertures can he enhanced about 100 times more than that of the normal square aperture with the same opening area. It is found that V-shaped aperture can provide a spot size roughly 10 - 15 nm smaller in both the x and y directions than the L-shaped aperture with a comparable light intensity peak until the distance reaches 60 nm. This analysis provides a guide for the optimal design of L-shaped aperture and V-shaped aperture for the near-field optics such as optical nanomieroscopy, data storage, nanulithography, manipulation, and so on.

关 键 词：近场光学 纳米小孔 时域有限差分法 场增强 

分 类 号：TH742[机械工程—光学工程] TG115.21[机械工程—仪器科学与技术]