离子束辅助轰击对电弧离子镀沉积TiAlN膜层的影响  

EFFECT OF ION BEAM ASSISTED BOMBARDMENT ON TiAlN COATINGS DEPOSITED BY ARC ION PLATING

作　　者：吕树国[1,2] 刘常升[1] 李玉海[2] 张罡[2] 毕监智[2] 金光[2] 

机构地区：[1]东北大学材料与冶金学院,沈阳110004 [2]沈阳理工大学中俄联合高能束流实验室,沈阳110168

出　　处：《腐蚀科学与防护技术》2009年第3期273-276,共4页Corrosion Science and Protection Technology

基　　金：科技部国际合作重点项目(2004DFA4800)

摘　　要：采用俄罗斯UVN0.5D2I离子束辅助电弧离子镀沉积设备,在高速钢W18Cr4V基材上沉积TiAlN膜层;利用N离子束对膜层沉积之前的预处理和膜层沉积时的辅助轰击,并用SEM、X射线衍射和力学测试等手段研究了N离子束轰击对膜层表面形貌、相结构、显微硬度影响.结果表明:N离子束的预处理在基材表面形成了一定厚度N的过渡层;N离子束对膜层的辅助轰击,明显地降低了膜层表面"大颗粒"的密度,改善了膜层的表面形貌;同时,形成了由过渡层成分与膜层成分动态混合的扩散层;无N离子轰击时,TiAlN膜层是由(TiAl)N相和Ti2AlN相组成;轰击能量为7.5 keV时,TiAlN膜层也是由(TiAl)N相和Ti2AlN相组成,但(TiAl)N(111)取向减弱,而(200)和(220)取向均增强;Ti2AlN(211)及(301)取向均减弱.N离子束辅助轰击,使膜层的显微硬度由原来的21 GPa提高到25.3 GPa.TiAIN coatings were deposited on W18Cr4V steel by Russia UVN 0. 5 D2I ion beam assisted arc ion plating facility. The effect of N ion beam bombarding before and during coating deposition on its morphology, phase structure and micro hardness of deposited coatings was studied. SEM observation revealed that a transition layer on substrate surface was formed by N ion beam pretreatment, the density of large particles on coating surface was decreased obviously, and a dynamic mixing diffusion layer was formed by N ion beam assisted bombardment. XRD analysis indicated that TiA1N layer was consisted of TiA1N and Ti2 A1N phases without N ion beam bombarding, but with 7. 5 keV bombard energy, preferential orientation TiA1N（ 111 ） weakened, （ 200 ） and （ 220 ） enhanced, and Ti2A1N （ 211 ） and （ 301 ） also weakened. The micro hardness of coatings increased from 21 GPa to 25.3 GPa.

关 键 词：离子束 TiAIN膜层 电弧离子镀 显微硬度 表面形貌 

分 类 号：TG174.444[金属学及工艺—金属表面处理]