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作 者:陈利菊[1,2] 姚保利[1] 韩俊鹤[1] 郜鹏[1] 陈懿[3] 王英利[1] 雷铭[1]
机构地区:[1]中国科学院西安光学精密机械研究所瞬态光学与光子技术国家重点实验室,西安710119 [2]中国科学院研究生院,北京100049 [3]中国科学院物理化学技术研究所,北京100080
出 处:《光子学报》2009年第5期1182-1186,共5页Acta Photonica Sinica
基 金:国家自然科学基金(60337020,60678023)资助
摘 要:提出了一种简单直观的方法研究光致变色材料二芳基乙烯/PMMA膜的抗疲劳特性.通过测量样品在漂白和呈色过程中探测光的透过率,分析该样品光致变色过程的最佳曝光量,在此基础上测量样品的抗疲劳特性.结果显示:在漂白和呈色过程中,激发红光和紫光的最佳曝光量为分别为1900J/cm2和600mJ/cm2,表明该材料对红光不敏感,对紫光比较敏感.定义漂白-呈色过程中,探测光透过率稳定值差下降为第一次循环的50%时样品已经疲劳.通过交替的漂白-呈色循环,测得这种二芳基乙烯材料的擦写次数为27次.A simple and intuitionistic method was presented to measure the fatigue resistance of photochromic diarylethene/PMMA film. The optimal exposure was analyzed by measuring the transmission of diarylethene in the bleached and colored process,in basis of which fatigue resistance was measured. The results indicate that the best exposure of bleached and colored process are 1 900 J/cm^2 and 600 mJ/cm^2 respectively, which shows diarylethene is insensitive to red light and sensitive to purple light. The fatigue of the material was defined as the transmission difference of steady value declines to 50% of that of the first bleached-colored process,then the number of write-erasure of diarylethene was measured as 27.
关 键 词:光致变色 二芳基乙烯 抗疲劳特性 漂白-呈色过程
分 类 号:TN204[电子电信—物理电子学]
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