泡沫镍网负载TiO_2薄膜的光催化特性  

Photocatalytic Performance of the TiO_2 Films on Foam Nickel Substrates

作　　者：凌基薇[1] 胡海[1] 袁坚[1] 施建伟[1] 上官文峰[1] 

机构地区：[1]上海交通大学机械与动力工程学院,上海200240

出　　处：《上海交通大学学报》2009年第5期755-758,共4页Journal of Shanghai Jiaotong University

基　　金：国家高技术研究发展计划(863)项目资助(2007AA061405)

摘　　要：在紫外光照射的静态反应体系中，利用乙醛气体降解试验研究了泡沫镍网负载TiO2／SiO2薄膜的光催化特性，考察了不同光辐射强度和光源波长对光催化效率的影响．结果表明：光辐射强度和光源波长对光催化降解活性影响很大，对于初始浓度为0．01％的乙醛气体污染物，紫外线杀菌灯比黑光灯具有更好的光催化降解效果，其合适的光辐射强度在4．0～4．5w／m^2之间；TiO2／SiO2薄膜光催化剂具有良好的稳定性，经多次使用后，通过加热和水洗等简单方法能够完全再生，并继续保持良好的稳定性．The photocatalyst TiO2 films were immobilized on foam nickel substrates modified with SiO2 films as transition layer （indicated as S2T2 films）. The photocatalytic performance of the S2T2 films was tested through photocatalytic degradation reactions of gaseous acetaldehyde in a static system and under ultraviolet light irradiation. The influence of different intensity and wavelength on the degradation activity was investigated, and it was found that the bactericidal lamp with 2=253.7 nm has higher degradation activity compared to black light lamp （2=365 nm）, and the appropriate light intensity is between 4.0-4.5 W/m^2. The results also indicate that the S2T2 films have a good stability and they are easy to be regenera- ted by some ordinary ways.

关 键 词：泡沫镍网 TIO2/SIO2 薄膜 光催化 乙醛降解 光辐射强度 

分 类 号：TK511[动力工程及工程热物理—热能工程]