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机构地区:[1]装备指挥技术学院士官系,北京102249 [2]装甲兵工程学院再制造工程系,北京100072
出 处:《表面技术》2009年第3期30-32,60,共4页Surface Technology
摘 要:为了研究n-Al2O3/Ni-P化学复合镀层的表面质量,通过正交试验,得到n-Al2O3/Ni-P化学复合镀的最佳工艺参数为:温度86℃,pH值为5.2,搅拌量60L/h,纳米含量8g/L,表面活性剂A为2g/L,B为40mL。以镀层的硬度、孔隙率和表面粗糙度为评价标准,结果表明,n-Al2O3/Ni-P化学复合镀镀层的表面质量优于Ni-P化学镀:n-Al2O3/Ni-P化学复合镀镀层表面均匀致密,孔隙率等级为9级,硬度达到620HV,表面粗糙度Ra0.628μm。For study the surface quality of film of n-Al2O3/Ni-P electroless composite plating, by orthogonal test, the process conditions of n-Al2O3/Ni-P composite electroless were optimized as follows: temperature of 86 ℃, pH value of 5.2,60L/h of agitation quantity, 8g/L of nano-Al2O3 content, 2g/L of A and 40mL of B of effects surfactants. Using the hardness, porosity, surface-roughness-degree as evaluation criterion, results show that the surface quality of film of n-Al2O3/Ni-P electroless composite plating is better than that of film of Ni-P electroless plating: the surface of film of n-Al2O3/Ni-P composite electroless is even and dense, porosity is 9 grade, hardness can reach 620HV, and surface roughness degree is 0.628 μm.
关 键 词:纳米颗粒 化学复合镀 正交试验 硬度 表面粗糙度
分 类 号:TQ153.2[化学工程—电化学工业]
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