低信膜比条件下金膜电极电位溶出分析法研究  

Potentiometric Stripping Analysis with a Thin Film Gold Electrode under Small Ratios of Signal to Thickness Square

作　　者：阮湘元[1] 白燕 周友明[1] 苏亚玲[1] 冯德雄 赵鸿斌 

机构地区：[1]东莞理工学院应用化学系

出　　处：《分析测试学报》1998年第3期13-17,共5页Journal of Instrumental Analysis

摘　　要：推导并验证了信号与金膜厚度的比值较小（即低信膜比）时金膜电极电位溶出分析法的过渡时间方程式和电位时间方程式。实验确定的理论式的应用条件为τ／ｌ２≤５８×１０１０ｓ／ｃｍ２，并发现当扩散路径约为扩散层厚度的３倍时，便可按半无限扩散条件处理扩散问题。从而解决了利用小信号进行金膜电极电位溶出基本问题，即信号与浓度的定量关系。Transition time equation and potential_time equation describing the potentiometric stripping processes on a thin gold film electrode(TFGE)are presented. The equations were verified experimentally under the condition that the ratio of signal to the square of film thickness τ/l2≤58×10 s·cm-2. It was found that the diffusion process can be treated as semi_infinite, provided the diffusion path is approximately three times of the diffusion layer thickness. Thus, the basic problem of handling small signals with gold_film electrode stripping has been solved. In other words, a quantitative relationship between the signal and metal concentration has been established.

关 键 词：金膜电极 半无限扩散 扩散层厚度 电位溶出分析 

分 类 号：O657.1[理学—分析化学]