物理气相沉积TiN涂层的研究现状与展望  

Prospect and Current Status of Research on Physical Vapor-Deposited TiN Coating

作　　者：黄艳[1] 魏仕勇[1] 蒋庐珍[1] 

机构地区：[1]江西省科学院,江西南昌330029

出　　处：《江西科学》2009年第3期466-471,共6页Jiangxi Science

摘　　要：综述了近年来物理气相沉积TiN多元和多层涂层、化学镀Ni-P与PVD和气体氮化与PVD的研究及应用。并指出通过将物理气相沉积与其他表面强化技术结合制取复合涂层及合理的多元、多层设计,可进一步发挥PVD TiN涂层的优势,克服单一TiN涂层的不足。Summary of physical vapor deposition in recent year＇s diversified and multi-layer TiN coating,Research and Application of Chemical Plating Ni-P and PVD ,Gas nit riding and PVD. And pointed out by physical vapor deposition and other surface hardening technology composite coating system check and a reasonable multiple, multi-layer design. PVDTiN coating can be further exerting the advantage of overcoming the shortcomings of the single TiN coating.

关 键 词：TIN涂层 多元 多层涂层 复合涂层 

分 类 号：TG174.444[金属学及工艺—金属表面处理]