新型片状磷平面扩散源的应用研究  

Application Study of a New Sheet Solid Phosphorous Planar Diffusion Source

作　　者：王彩琳[1] 赵万里 刘永祥 

机构地区：[1]西安理工大学电子工程系,西安710048 [2]无锡华润华晶微电子有限公司,江苏无锡214061

出　　处：《固体电子学研究与进展》2009年第2期297-301,共5页Research & Progress of SSE

基　　金：陕西省自然科学基金资助项目(项目编号:2007E208)

摘　　要：分析了新型片状固态磷平面扩散源(PDS)的掺杂机理,并与液态POCl3源扩散进行了比较,指出可用片状固态磷PDS来替代POCl3实现磷扩散工艺的预沉积。基于PDS预沉积的实验结果,分析了影响方块电阻大小及其均匀性的关键因素,给出了工艺方案,并通过实际产品的电学参数测量结果验证了工艺方案的可行性,可供新型片状磷PDS在大直径硅扩散工艺中的推广使用参考。The doping mechanism of sheet solid phosphorous Planar Diffusion Source （PDS） was studied and compared with the liquid POCI3 source. It was pointed out that the pre-deposition process of POC13 could be replaced by the sheet solid phosphorous PDS based on the experiment results of the sheet solid phosphorous PDS pre-deposition process, the key influencing factors on the square resistance and its uniformity of the diffusion layer were analyzed. Finally, the process scheme of sheet solid phosphorous PDS was given, and its feasibility has beeh validated based on the practical product electricity parameters test results. The results can provide reference for the sheet solid phosphorous PDS used in phosphor diffusion of large diameter silicon wafer.

关 键 词：扩散 片状固态源 磷 均匀性 

分 类 号：TN305.4[电子电信—物理电子学]