改进的SILAR法制备ZnO薄膜及其表征  

Preparation and Characterization of ZnO Films by Modified SILAR Method

作　　者：张苓[1] 刘杰[1] 侯明东[1] 孙友梅[1] 段敬来[1] 姚会军[1] 莫丹[1,2] 陈艳峰[1,2] 

机构地区：[1]中国科学院近代物理研究所,甘肃兰州730000 [2]中国科学院研究生院,北京100049

出　　处：《原子核物理评论》2009年第2期154-157,共4页Nuclear Physics Review

基　　金：国家自然科学基金资助项目(10775161,10375079,10575125);中国科学院“西部之光”人才培养计划联合学者项目(O850130XL0)~~

摘　　要：采用一种改进的液相成膜技术——连续离子层吸附与反应(SILAR)法,用锌氨络离子[Zn(NH3)4]2+溶液作为独立的前驱体溶液,以载玻片为衬底,在(125±5)℃的温度下沉积出致密、透明的ZnO薄膜。分别用冷场发射型扫描电镜(FESEM)和X射线衍射(XRD)分析了薄膜样品的表面形貌和结晶状态,用紫外-可见分光光度计(UV-Vis spectroscopy)研究了薄膜样品的发光性能。结果表明:获得样品为六角纤锌矿结构的多晶薄膜材料沿[002]方向择优生长;样品表面均匀、致密,厚度约为550nm;在可见光波段具有高的透射率(>80%)。A modified solution method, successive ionic layer adsorption and reaction（SILAR）, was applied to prepare transparent zinc oxide（ZnO） film on glass substrate at （125±5）℃ in mixed ion precursor solution. The surface morphology and crystallizations of films were analyzed by field emission scanning microscopy（FESEM） and X-ray diffraction（XRD）, respectively. The optical properties of the films were studied by ultraviolet visible（UV-Vis）spectroscopy. The results show that the obtained samples are polycrystalline films of hexagonal wurtzite structure, with the preference of [002] orientation. The as-deposited films exhibit uniform and compact surface morphology, with the film thickness of 550 nm, and have high transmittance in the visible band（〉80%）.

关 键 词：SILAR法 ZNO 薄膜 表征 

分 类 号：O484[理学—固体物理]