脉冲镀Ni-Co合金镀层内应力及钴含量的研究  

Internal Stress and Co Content of Pulse Electrodeposited Ni-Co Alloy Coatings

作　　者：陈艳容[1] 龙晋明[1] 裴和中[2] 洪建平[1] 石小钊[1] 

机构地区：[1]昆明理工大学材料与冶金工程学院,云南昆明650093 [2]昆明理工大学机电工程学院,云南昆明650093

出　　处：《电镀与精饰》2009年第7期1-3,17,共4页Plating & Finishing

基　　金：国防科工委军品配套项目"二代红外探测器杜瓦用高效冷屏件的研制"资金资助项目(JPPT1152676)

摘　　要：研究了脉冲镀Ni-Co合金的工艺,讨论了脉冲电镀中占空比及频率对镀层内应力及钴含量的影响。实验结果表明:镀层内应力随占空比的增加而降低,随脉冲峰值电流密度增加而升高,随温度的升高而降低。镀层中Co的质量分数则随温度的升高而升高。The pulse electrodeposition technique of Ni-Co and the effects of pulse duty cycle, frequency on internal stress and Co content of the coating were investigated. The results show that the internal stress increases with the increase in peak current density but decreases with the increase in pulse duty cycle and the electrolyte temperature. Co content in the alloy deposits increases with the increase in the electrolyte temperature.

关 键 词：脉冲电镀 Ni—Co合金 内应力 Co的质量分数 

分 类 号：TQ153.2[化学工程—电化学工业]